Nā Pahuhopu Sputtering Busbar Keleawe Maʻemaʻe Kiʻekiʻe (4N-6N)

Wehewehe Pōkole:

Nā kikoʻī huahana
Inoa: Pahuhopu Sputtering Busbar keleawe maʻemaʻe kiʻekiʻe
Kūlana: ASTM F68 (ʻAʻohe ʻOxygen Electronic Copper), ASTM B115, Maʻemaʻe ≥99.99% (4N-6N), RoHS Compliant, REACH Compliant
Mea Hana: C10100 (Keleawe OFHC), C10200 (Keleawe ʻOkikene ʻOle), Cu Maʻemaʻe Kiʻekiʻe (4N/5N/6N)
ʻIli: Mīkini/Polished Precision, Ra ≤0.5 μm, Koho Indium Bonding i ka Backing Plate
Lōʻihi: 500mm - 4000mm
Ka laulā: 50mm - 400mm
Mānoanoa: 5mm - 30mm
Nā Hiʻohiʻona Huahana: Maʻemaʻe kiʻekiʻe loa me ka liʻiliʻi o nā haumia · Ke alakaʻi uila a me ka wela maikaʻi loa · ʻAno like o ka microstructure no ka sputtering paʻa · Hoʻohana nui ʻia nā mea i ka waiho ʻana ma kahi nui · ʻAno like o ka kiʻiʻoniʻoni a me ka hoʻopili ʻana · Haʻahaʻa ka outgassing a me ka hana ʻāpana · Hoʻolōʻihi i ke ola o ka pahuhopu i nā kaʻina hana hoʻomau
Kahua Hoʻohana: Nā pūnaewele solar kiʻiʻoniʻoni lahilahi (CIGS, CdTe, perovskite), Nā hōʻikeʻike panela pālahalaha nui, Nā uhi aniani hoʻolālā, Nā uhi kaʻa a me nā mea hoʻonaninani, Nā pale pā a me nā mea uila maʻalahi, Nā papa pale i loko o ka hoʻopili ʻana, Nā ʻōnaehana waiho laina noiʻi-scale, Nā laina hana PVD kiʻekiʻe

E leka uila mai iā mākou

Nā kikoʻī huahana

Nā Lepili Huahana

Wikiō

Pahuhopu Sputtering Busbar Keleawe Maʻemaʻe Kiʻekiʻe - Kaʻina Hana a me ka Hōʻoiaʻiʻo Kūlana

Ua hoʻomohala kūikawā ʻia kā mākou mau pahuhopu busbar keleawe no ka waiho ʻana o ka mahu kino ma kahi nui, kahi e koʻikoʻi ai ka uhi like ʻana ma luna o nā lōʻihi i hoʻolōʻihi ʻia.

Nā hiʻohiʻona hana koʻikoʻi

Hoʻohana ka hana ʻana i nā ʻenehana metallurgical a me ka machining holomua e hāʻawi i ka hana mau:
●Mea Hoʻomaka: ʻO nā cathodes keleawe electrolytic premium me ka maʻemaʻe kiʻekiʻe i hōʻoia ʻia e lawelawe ana ma ke ʻano he kumu.
●Hoʻomaʻemaʻe Vacuum: Hoʻopau nā pae hoʻoheheʻe vacuum he nui i nā haumia kinoea a me nā metala e hoʻokō ai i nā pae 4N-6N.
●Ka Hoʻolei Hoʻomau: ʻO ka extrusion wela i kāohi ʻia a i ʻole ka hoʻolei hoʻomau e hana i nā ʻāpana lōʻihi a mānoanoa me ka ʻano like.
● Hana Wela: Hoʻomaʻemaʻe ka hana ʻana a me ka ʻōwili ʻana i ka nui o ka palaoa a hoʻokō i ka nui o ka manaʻo piha.
●ʻOki a me ka Mīkini Pololei: Hana ka ʻoki ʻana a me ka wili ʻana ma CNC i nā ana huinahā pololei me nā ʻaoʻao like.
●Hoʻomākaukau ʻIli: ʻO ka wili ʻana a me ka hoʻowali ʻana i nā pae he nui e hana i nā ʻili maʻemaʻe a ʻaʻohe kīnā.
●Nā Koho Hoʻopili: Loaʻa ka hoʻopili indium a elastomeric haʻahaʻa wela i nā papa kila kila a i ʻole molybdenum.
●Pūʻolo lumi maʻemaʻe: ʻO ka hoʻomaʻemaʻe ultrasonic hope loa a me ka sila ʻana o ka vacuum i ʻeke pālua e hōʻoia i ka lawe ʻana me ka ʻole o ka haumia.

ʻŌnaehana hoʻomalu maikaʻi

● Ka hiki ke hahai piha ʻia mai ke kumu cathode a i ka pahuhopu busbar i hoʻopau ʻia
● Hōʻoia piha o nā mea a me nā hōʻike hoʻāʻo i hāʻawi ʻia me kēlā me kēia ʻāpana
● Nā laʻana waihona i mālama ʻia he ≥3 mau makahiki no ka hōʻoia kūʻokoʻa (SGS, BV, a pēlā aku)
● Nānā 100% o nā palena koʻikoʻi:
• Hōʻoia maʻemaʻe (ka nānā ʻana o GDMS/ICP; ʻo ka oxygen maʻamau <5 ppm)
• Hoʻāʻo ʻana i ka mānoanoa (≥99.5% kumumanaʻo)
• Loiloi ʻana i ke ʻano o ka palaoa (metallography)
• Pololei o ke ana (CMM; parallelism ≤0.1mm maʻamau)
• Ka maikaʻi o ka ʻili a me ka ʻoʻoleʻa (profilometer + nānā ʻana i ka lumi maʻemaʻe)
● ʻOi aku nā kikoʻī kūloko ma mua o nā kūlana ASTM F68. Nā ʻano maʻamau: Ke alakaʻi wela >395 W/m·K, Ke ʻano sputtering arc-free kūlike, Nā helu hoʻokaʻawale kiʻekiʻe i nā ʻōnaehana magnetron.